Photo-induced non-linear susceptibility patterns in electro-optic polymers

被引：20

作者：

Martin, G ^{[1
]}

Toussaere, E ^{[1
]}

Soulier, L ^{[1
]}

Zyss, J ^{[1
]}

机构：

[1] ENS Cachan, UMR 8537, Lab Photon Quant & Mol, F-94235 Cachan, France

来源：

SYNTHETIC METALS | 2002年 / 127卷 / 1-3期

关键词：

microscopy; non-linear optical materials; periodic structures; SHG-mapping;

D O I：

10.1016/S0379-6779(01)00589-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present microscopic scale photo-induced non-linear susceptibility patterns in organic materials. This patterns are observed by reflection second harmonic generation microscopy and atomic force microscopy. The characteristics of the non-linear susceptibility tensor are engineered during the active film preparation. Several techniques have been used to pattern the non-linear response: re-alignment through a chrome mask of previously electrically poled samples, Lloyd-mirror interferometric configuration to imprint any desired susceptibility periodicity in the sample and all optical poling using mutually coherent beams from a frequency-doubled picosecond Nd:Yag laser. Images of different scanned patterns are shown, direct evidence of periodic structures, two-dimensional patterns and applications to 2D photonic crystals are discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：49 / 52

页数：4

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