Crystalline and nearly stoichiometric vanadium nitride thin film by PLD

被引：26

作者：

Dai, ZN

Miyashita, A

Yamamoto, S

Narumi, K

Naramoto, H

机构：

[1] JAERI Takasaki, Adv Sci Res Ctr, Gunma 3701292, Japan

[2] JAERI Takasaki, Dept Mat Dev, Adv Sci Res Ctr, Gunma 3701292, Japan

来源：

THIN SOLID FILMS | 1999年 / 347卷 / 1-2期

关键词：

deposition process; laser ablation; nitrides;

D O I：

10.1016/S0040-6090(98)01726-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Pulsed laser deposition (PLD) with a YAG:Nd laser was used to prepare vanadium nitride thin film. Different deposition conditions of different temperatures, substrates and gas pressure were explored. The films were characterized with XRD (X-ray diffractometer), XRD pole figure, AES (Auger electron spectrometry) and RBS (Rutherford backscattering spectrometry) /Channeling. It was found that crystalline and nearly stoichiometric VNx films with an x value of 0.96 on c plane alpha-Al2O3 had been prepared by YAG:Nd laser at 450 degrees C with the mixed gas of nitrogen and 3% hydrogen of 200 Pa, X-ray diffractometer, XRD pole figure, AES and RBS/Channeling surely confirm epitaxial and near stoichiometric growth. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：117 / 120

页数：4

共 14 条

[1] MAGNETIC-SUSCEPTIBILITY AND SUPERCONDUCTIVITY OF CUBIC VANADIUM NITRIDES [J].