X-ray photoelectron spectroscopy studies of thin GexSb40-xS60 chalcogenide films

被引:21
作者
Jiang, LD [1 ]
Fitzgerald, AG
Rose, MJ
Christova, K
Pamukchieva, V
机构
[1] Univ Dundee, Carnegie Lab Phys, Dept Elect Engn & Phys, Dundee DD1 4HN, Scotland
[2] Bulgarian Acad Sci, Inst Solid State Phys, Sofia 1784, Bulgaria
关键词
D O I
10.1016/S0022-3093(01)00925-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin GexSb40-xS60 (x = 5, 15, 20, 25 and 27) chalcogenide films have been investigated by X-ray photoelectron spectroscopy (XPS). X-ray photoelectron spectra show that there is a peculiarity in the relative intensity ratio of the Sb 4d photoelectron peak associated with Sb2S3 to the Sb 4d photoelectron peak associated Sb2S5 at an average co-ordination number Z of 2.65-2.67. After contamination and photo-oxidation layers were removed from the surface of the films, X-ray photoelectron spectra were measured again. It has been found that binding energies of the Ge 2p and Sb 3d(3/2) photoelectron peaks, which reflect the electronic structure at lower core energy levels, are independent of Z. However, the binding energies of the Ge 3d and Sb 4d photoelectron peaks are more sensitive to Z and have a discontinuity at Z = 2.65. (C) 2002 Elsevier Science B.V. All rights reserved.
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页码:13 / 17
页数:5
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