Regular trends in uptake of halogens by alkali silicate glasses containing two glass-forming components

被引：17

作者：

Kiprianov, AA ^{[1
]}

机构：

[1] St Petersburg State Univ, St Petersburg, Russia

来源：

RUSSIAN JOURNAL OF APPLIED CHEMISTRY | 2006年 / 79卷 / 01期

关键词：

D O I：

10.1134/S1070427206010058

中图分类号：

O69 [应用化学];

学科分类号：

081704 [应用化学];

摘要：

Oxyhalide alkali silicate glasses M2O-R2O3-SiO2 + Hal (M = Li, Na, K; R = B, Al; Hal = F, Cl) containing two network-forming components were prepared, and their bulk thermal and electrical properties were studied.

引用

页码：20 / 28

页数：9

共 30 条

[1]

BELYAEV GI, 1965, STEKLO KERAM, P34

[2]

Bezborodov M. A., 1968, SINTEZ STROENIE SILI

[3]

Callow R.J., 1949, J. Soc. Glas. Technol., V33, P255

[4]

Trimethylsilylation analysis of the silicate structure of fluoro-alumino-silicate glasses and the structural role of fluorine [J].

Hill, R ;

Wood, D ;

Thomas, M .

JOURNAL OF MATERIALS SCIENCE, 1999, 34 (08) :1767-1774

[5]

HIRAYAMA C, 1969, GLASS TECHNOL, V10, P123

[6]

JUMA QA, 1982, ADV CERAM, V4, P218

[7]

KARPUKHINA NG, 2001, THESIS

[8]

F-19NMR study of the ordering of high field strength cations at fluoride sites in silicate and aluminosilicate glasses [J].

Kiczenski, TJ ;

Du, LS ;

Stebbins, JF .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 337 (02) :142-149

[9]

The deposition of SiOF film with low dielectric constant in a helicon plasma source [J].

Kim, JH ;

See, SH ;

Yun, SM ;

Chang, HY ;

Lee, KM ;

Choi, CK .

APPLIED PHYSICS LETTERS, 1996, 68 (11) :1507-1509

[10]

KIPRIANOV AA, 2001, FIZ KHIM STEKLA, V27, P101

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