Nanometer scale patterning of Langmuir-Blodgett films of gold nanoparticles by electron beam lithography

被引：104

作者：

Werts, MHV

Lambert, M

Bourgoin, JP ^{[1
]}

Brust, M

机构：

[1] CEA Saclay, Serv Chim Mol, F-91191 Gif Sur Yvette, France

[2] Univ Liverpool, Dept Chem, Liverpool L69 7ZD, Merseyside, England

来源：

NANO LETTERS | 2002年 / 2卷 / 01期

关键词：

D O I：

10.1021/nl015629u

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Electron beam lithography on Langmuir-Blodgett films of alkanethiol-capped gold nanoparticles is shown to be a viable strategy to define nanometer scale structures of such particles. Sub-50 nm wide "nanowires", the thickness of which is controlled at the single particle level, are created with e-beam doses in the mC/cm(2) range. It is shown that the patterns are formed by radiation-induced cross-linking of the alkyl chains and that they can be contacted and studied electrically.

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页码：43 / 47

页数：5

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