Magnetoimpedance effect in structured multilayered amorphous thin films

被引:23
作者
Correa, M. A. [1 ]
Bohn, F. [2 ]
Viegas, A. D. C. [3 ]
de Andrade, A. M. H. [4 ]
Schelp, L. F. [2 ]
Sommer, R. L. [5 ]
机构
[1] Univ Fed Pampa, BR-96570000 Cacapava Do Sul, RS, Brazil
[2] Univ Fed Santa Maria, Dept Fis, BR-97105900 Santa Maria, RS, Brazil
[3] Univ Fed Santa Maria, Dept Fis, BR-88010970 Florianopolis, SC, Brazil
[4] Univ Fed Santa Maria, CESNORS, BR-98400000 Frederico Westphalen, RS, Brazil
[5] Ctr Brasileiro Pesquisas Fis, BR-22280180 Rio De Janeiro, RJ, Brazil
关键词
D O I
10.1088/0022-3727/41/17/175003
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, we report magnetoimpedance (MI) results for frequencies of up to 1.8 GHz in a series of as deposited nano-structured [F/Cu/F] and [F/i/Cu/i/F] films where F is a Fe-rich alloy/Cu multilayer and i is a SiO2 insulating layer. A high MI ratio (205%) was obtained at 180 MHz for the [F/i/Cu/i/F] structure. The results are analysed in terms of the SiO2 insulating layer geometry and of the widths of the ferromagnetic and conductive layers.
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页数:6
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