Propylene deep oxidation on the Pt(111) surface: temperature programmed studies over extended coverage ranges

Propylene oxidation was studied on the Pt(111) surface over a wide range of reaction stoichiometries using temperature programmed methods. Reaction of propylene with excess oxygen results in complete oxidation to water and carbon dioxide, with oxydehydrogenation to form water beginning at 290 K. The initiation of skeletal oxidation occurs after water formation begins, except for the highest propylene coverages. A stable dehydrogenated intermediate with a C3H5 stoichiometry is formed in the 300 K temperature range during oxidation. Reaction of propylene with substoichiometric amounts of oxygen results in incomplete oxidation with hydrocarbon decomposition dominating after depletion of surface oxygen. Increasing oxygen overage results in more complete oxidation. Oxidation processes result in water, carbon dioxide, and carbon monoxide, while decomposition results in hydrogen, propylene, and propane desorption with some surface carbon remaining. Propylene-d(6) and selectively labeled propylene-3,3,3-d(3) (CH2CHCD3) experiments indicated initial water formation results from oxydehydrogenation of one of the olefinic hydrogens. At the highest propylene and oxygen coverages studied, we observed small amounts of partial oxidation which indicate that the vinyl hydrogen is removed initially, resulting in the formation of an adsorbed H2CCCH3 intermediate. The partial oxidation products observed are acetone desorbing at 200 K and acetic acid at 320 K. Removal of the first skeletal carbon begins at 320 K, except for the highest propylene coverages. Preadsorption of molecular oxygen limits adsorption of propylene and preadsorption of propylene limits molecular oxygen adsorption at 110 K. Similar oxidation mechanisms are observed following initial adsorption of both molecular and atomic oxygen, which is expected since molecular oxygen dissociates and/or desorbs well below oxidation temperatures. (C) 1999 Published by Elsevier Science B.V. All rights reserved.