5 mm high-power-density dual-delta-doped power HEMT's for 3 V L-band applications

被引:44
作者
Lai, YL
Chang, EY
Chang, CY
Chen, TK
Liu, TH
Wang, SP
Chen, TH
Lee, CT
机构
[1] NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU 300,TAIWAN
[2] NATL CHIAO TUNG UNIV,INST MAT SCI & ENGN,HSINCHU 300,TAIWAN
[3] NATL NANO DEVICE LABS,HSINCHU 300,TAIWAN
[4] HEXAWAVE PHOTON SYST,HSINCHU 300,TAIWAN
[5] NATL CENT UNIV,INST OPT SCI,CHUNGLI 320,TAIWAN
关键词
D O I
10.1109/55.491838
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A high-power-density dual-delta-doped AlGaAs/InGaAs/GaAs high electron mobility transistor (HEMT) for personal communication applications has been developed. A 5.0 mm gate-width device operating at a drain bias of 3.0 V gave an output power over 1 W, The 1 mu m gate-length HEMT exhibited a current density of 425 mA/mm at V-gs = 0.5 V, The maximum transconductance of the device was 270 mS/mm, The effective knee voltage was as low as 0.3 V, At the class AB operation, the HEMT demonstrated an output power density of 200 mW/mm, 64% power-added efficiency and 18.2 dB linear gain at 900 MHz, This is the highest power density of a dual-delta-doped AlGaAs/InGaAs/GaAs HEMT reported to date for low voltage (3 V) wireless applications.
引用
收藏
页码:229 / 231
页数:3
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