Comparison of spray pyrolyzed FTO, ATO and ITO coatings for flat and bent glass substrates

被引:144
作者
Bisht, H [1 ]
Eun, HT [1 ]
Mehrtens, A [1 ]
Aegerter, MA [1 ]
机构
[1] Univ Saarland, Inst Neue Mat, Dept Coating Technol, D-66123 Saarbrucken, Germany
关键词
coatings; deposition process; indium tin oxide; tin oxide;
D O I
10.1016/S0040-6090(99)00254-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transparent conductive FTO, ATO and ITO films were synthesized by spray pyrolysis technique on flat 12 x 12 cm borosilicate glass substrates at 500-550 degrees C and investigated with respect to their electrical and optical properties. The resistivity of sprayed ITO films decreases with the thickness down to 3.0 x 10(-4) Omega cm (300 nm). The optical transmission in the visible range is 80% and the near IR reflection up to 96% for thicknesses larger than 300 nm. A reducing treatment at 400 degrees C in forming gas still decreases the resistivity by a factor of two. Bending of the coated glasses in air at 650 degrees C for 1.5 h increases the resistivity of the coatings on the tensile side of the substrate by a factor of 3-4 and by a factor 2 on the compressed side. A subsequent reducing treatment in forming gas at 400 degrees C leads to a drastic decrease of resistivity in both cases by a factor of 5-7 with resulting value rho = 2-3 x 10(-4) Omega cm. ATO layers have lower visible transmission (70-75%) due to stronger absorption and a higher resistivity (rho = 1 X 10(-3) 12 cm). Spray pyrolyzed FTO coatings have a resistivity rho = 5 x 10(-3) Omega cm for film thicknesses >350 nm. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:109 / 114
页数:6
相关论文
共 5 条
  • [1] TRANSPARENT CONDUCTORS - A STATUS REVIEW
    CHOPRA, KL
    MAJOR, S
    PANDYA, DK
    [J]. THIN SOLID FILMS, 1983, 102 (01) : 1 - 46
  • [2] X-RAY AND OPTICAL MEASUREMENTS IN THE IN2O3-SNO2 SYSTEM
    FRANK, G
    KOSTLIN, H
    RABENAU, A
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 52 (01): : 231 - 238
  • [3] GROSSE P, 1979, FREIE ELEKTRONEN FES
  • [4] HARTNAGEL H., 1995, Semiconducting Transparent Thin Films
  • [5] ELECTRICAL-PROPERTIES OF UNDOPED IN2O3 FILMS PREPARED BY REACTIVE EVAPORATION
    NOGUCHI, S
    SAKATA, H
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1980, 13 (06) : 1129 - 1133