Photolithographic hole-transport layer derived from electrochemical deposition of oligo(5-vinyl-2-nitrobenzyl triphenylamine-4-carboxylate)

被引：15

作者：

Chang, Chin-Chuan ^{[1
]}

Leung, Man-kit ^{[1
,2
]}

机构：

[1] Natl Taiwan Univ, Dept Chem, Taipei 106, Taiwan

[2] Natl Taiwan Univ, Inst Polymer Sci & Engn, Taipei 106, Taiwan

来源：

CHEMISTRY OF MATERIALS | 2008年 / 20卷 / 18期

关键词：

D O I：

10.1021/cm800898u

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Electrochemically deposited layer (EDL) prepared from electropolymerization of oligo(5-vinyl-2-nitrobenzyl triphenylamine-4-carboxylate) on conductive indium tin oxide glass (ITO) showed photolithographic properties as well as good hole-injection and transport properties. Under the optimized conditions, the polymeric light-emitting device (PLED) of ITO/EDL/polyvinylcarbazole(PVK)-Ir(PPY)(3)[2-bihenylyl-5-(4'-tert-butylphenyi)oxadiazole] (PBD)/Ma-Ag had a turn-on voltage of 13.5 V (100 cd/m(2)) with a maximum brightness of 9100 cd/m(2) and the current efficiency of 10.3 cd/A. When the EDL was exposed to UV liight (365 nm) through a patterned photomask and developed in CH2Cl2, a positive image was obtained. After irradiation for 8 min through a band-pass filter (17 mW/cm(2)) by a Xeon lamp, the EDL became soluble and could be depleted completely in CH,Cl,. Patterned PLED device was also fabricated by this technique.

引用

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页码：5816 / 5821

页数：6

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