Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region

被引:18
作者
Matsuzawa, NN [1 ]
Ishitani, A [1 ]
Dixon, DA [1 ]
Uda, T [1 ]
机构
[1] NTT Atsugi R&D Ctr, Atsugi Res Ctr, Assoc Superadvanced Elect Technol, Atsugi, Kanagawa 24301, Japan
来源
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2 | 2001年 / 4345卷
关键词
VUV lithography; F-2; lithography; transition energy; oscillator strength; time-dependent density functional theory; Rydberg transition; fluorination;
D O I
10.1117/12.436871
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to aid in the design of transparent materials for use as photoresists for F, lithography (157 nm), we have performed time-dependent density functional theory (TD-DFT) calculations of the photoabsorption of molecules in the vacuum ultraviolet region. The application of this TD-DFT method to the prediction of photoabsorption was benchmarked using model molecules such as formaldehyde, and an empirical equation for correcting the calculated transition energy was obtained. The TD-DFT method with the empirical correction equation provides dramatically more accurate results than those obtained with the CIS (single-excitation configuration interaction) method, which we employed in previous studies. We used it to predict the photoabsorption of various molecules such as methanol, t-butylalcohol, acetic acid, methyl acetate, cycloalkane, norbonane, tricyclodecane, tetrahydropyrane, adamantane, maleic anhydride and their fluorinated derivatives.
引用
收藏
页码:396 / 405
页数:10
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