The structure of Co films on Cu(111) up to 15 ML

被引：31

作者：

Muller, S ^{[1
]}

Kostka, G ^{[1
]}

Schafer, T ^{[1
]}

delaFiguera, J ^{[1
]}

Prieto, JE ^{[1
]}

Ocal, C ^{[1
]}

Miranda, R ^{[1
]}

Heinz, K ^{[1
]}

Muller, K ^{[1
]}

机构：

[1] UNIV AUTONOMA MADRID,DEPT FIS MADERIA CONDENSATA,E-28049 MADRID,SPAIN

来源：

SURFACE SCIENCE | 1996年 / 352卷

关键词：

cobalt; copper; low energy electron diffraction (LEED); metallic films; scanning tunneling microscopy; surface tension;

D O I：

10.1016/0039-6028(95)01088-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

New structural results of the epitaxial growth of Co/Cu(111) in the coverage regime 1.5-15 ML are presented as investigated by quantitative LEED and STM. In the low coverage regime there is pure fee stacking with copper diffused on top of 30% of the domains. The growth is ideally pseudomorphic. At intermediate coverages hcp stacked domains develop on the cost of fee domains whereby the latter seem to be stabilized by their top copper layer. At high coverages the film is predominantly hcp exhibiting the ideal lattice parameter of Co(0001).

引用

页码：46 / 49

页数：4

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