Studies on electrochromic properties of nickel oxide thin films prepared by reactive sputtering

被引：55

作者：

Liu, Huaran ^{[1
]}

Zheng, Wenming ^{[1
]}

Yan, Xin ^{[1
]}

Feng, Boxue ^{[1
]}

机构：

[1] Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou 730000, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2008年 / 462卷 / 1-2期

关键词：

nickel oxide; sputtering; electrochromic properties; optical properties;

D O I：

10.1016/j.jallcom.2007.08.066

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 [物理化学]; 081704 [应用化学];

摘要：

The non-stoichiometric nickel oxide (NiOx, x > 1) films deposited on a conducting substrate by RF magnetron sputtering have been investigated for electrochromism in alkaline solution. It was found that both Ni3+ and Ni2+ existed in NiOx films. The intercalation and deintercalation of H+ ions causes the bleaching and coloring of NiOx films. The atomic ratio of Ni and O in the NiOx films is 0.7:1 (as-deposited); 0.51:1 (bleached); 0.45:1 (colored). The maximal optical density change was found to be 0.78 at a spectral of 326 nm. With the increase of temperature of heat treatment, the electrochromic properties of NiOx films were weakened. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：356 / 361

页数：6

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