High photorefractive sensitivity at 860 nm in reduced rhodium-doped KNbO3

被引:11
作者
Ewart, M
Ryf, R
Medrano, C
Wuest, H
Zgonik, M
Gunter, P
机构
[1] Nonlinear Optics Laboratory, Institute of Quantum Electronics, Swiss Fed. Institute of Technology
关键词
D O I
10.1364/OL.22.000781
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We show that high-temperature reduction in a CO-CO2 atmosphere increases the photorefractive sensitivity of KNbO3:Rh at 860 nm by 3 orders of magnitude compared with that of the as-grown crystal. The effective trap density is increased by a factor of 3, and the photoconductivity by a factor of 30, and the photorefractive response at a grating spacing of 0.15 mu m is accelerated by a factor of 400. The grating buildup time at a grating spacing of 0.7 mu m and an intensity of 1 W cm(-2) is 0.5 a, a value comparable with that of as-grown The optical and photorefractive parameters of Rh-doped KNbO3 subjected to reduction treatment are characterized for wavelengths of 0.48-1.064 mu m. (C) 1997 Optical Society of America.
引用
收藏
页码:781 / 783
页数:3
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