MOCVD of SnO2 thin films from a new organometallic precursor

The present work deals with the use and advantages of diethylaminodimethylstannane(Iv) (I) as precursor for the CVD of SnO2 thin films. The films are deposited on alpha-Al2O3 and SiO2/Si(100) in O-2+H2O atmospheres, at temperatures ranging from 400 to 500 degrees C. High-purity, nanocrystalline layers with (101) preferential orientation are always obtained. A novel procedure for doping SnO2 films with RuO2, which consists in a chemical bath deposition on tin dioxide layers, is also described. Particular emphasys is given to the possibility of tailoring material properties by a proper choice of the synthesis conditions. The thermal decomposition pattern of the precursor (I) is studied by an H-1-NMR analysis of its pyrolysis byproducts. The microstructure of the samples is investigated by;XRD, while their surface and in-depth chemical composition is studied by XPS. The morphology of:the films and its dependance on the nature of the growth surface is examined by AFM. Electrical measurements indicate that RuO2 introduction in the SnO2 host matrix induces an appreciable enhancement of the layer conductivity.