Influence of electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and RuO2 nanocrystalline films

被引：14

作者：

Barison, S

Barreca, D

Daolio, S

Fabrizio, M

Tondello, E

机构：

[1] CNR, IENI, I-35127 Padua, Italy

[2] Univ Padua, Dipart CIMA, CNR, ISTM, I-35131 Padua, Italy

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2002年 / 12卷 / 05期

关键词：

D O I：

10.1039/b110611m

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Modifications of nanocrystalline RuO2 and Ru films, chemical-vapor deposited on Ti substrates, are studied in aqueous media, at the initial stages of electrocatalytic O-2 evolution. The microstructure, composition and morphology of the films are examined ex situ by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and atomic force microscopy (AFM). Results concerning the influence of electrochemical processing on the chemico-physical properties and electrode behavior are presented and discussed.

引用

页码：1511 / 1518

页数：8

共 21 条

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