A spectroscopic study of active species in DC and HF flowing discharges in N-2-H-2 and Ar-N-2-H-2 mixtures

被引:52
作者
Bockel, S [1 ]
Amorim, J [1 ]
Baravian, G [1 ]
Ricard, A [1 ]
Stratil, P [1 ]
机构
[1] UNIV PARIS 11,PHYS GAZ & PLASMAS LAB,URA CNRS,F-91405 ORSAY,FRANCE
关键词
D O I
10.1088/0963-0252/5/3/026
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Optical emission spectroscopy and laser-induced fluorescence (LIF) techniques are used to study the production of active species in DC and HF N-2-H-2 and N-2-H-2-Ar flowing discharges and post-discharges, in connection with plasma reactions for surface treatments. N and H ground state atom relative densities are obtained by two-photon LIF in a N-2-H-2 flowing DC discharge and in the DC and HF post-discharge regions. The conditions to create maximum density of N and H species are determined in each case in relation to the plasma kinetics. In no case was the NH radical observed in the post-discharge regions, indicating that this radical does not contribute to the nitriding process.
引用
收藏
页码:567 / 572
页数:6
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