Polyhedral oligomeric silsesquioxanes (POSS) thermal degradation

被引:342
作者
Fina, A
Tabuani, D
Carniato, F
Frache, A
Boccaleri, E
Camino, G
机构
[1] Politecn Torino, Ctr Cultura Ingn Mat Plast, I-15100 Alessandria, Italy
[2] Univ Piemonte Orientale, Dip Sci & Tecn Avanzate, I-15100 Alessandria, Italy
关键词
POSS; silsesquioxane; thermal degradation;
D O I
10.1016/j.tca.2005.10.006
中图分类号
O414.1 [热力学];
学科分类号
摘要
The mechanism of thermal degradation of several substituted polyhedral oligomeric silsesquioxanes (POSS) cages is studied in this work. Hydrogen POSS and methyl POSS shows incomplete sublimation on heating, both in inert atmosphere and in air. Isobutyl and octyl substituted POSS undergo an almost complete evaporation when heated in inert atmosphere. In air, oxidation competes with volatilization, producing a considerable amount of silica-like residue on heating up to 800 degrees C. Phenyl POSS shows a higher thermal stability than saturated aliphatic POSS and limited volatility, producing a ceramic residue at high yield on heating in nitrogen, composed of a silica containing a considerable amount of free-carbon. A lower amount of residue is shown after heating in air, corresponding to the POSS Si-O fraction. A vinyl POSS cage/network resin is also studied, in comparison to above materials, showing the highest ceramic yield. (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:36 / 42
页数:7
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