Adatom lifetime in film growth at solid surfaces in the framework of the Johnson-Mehl-Avrami-Kolmogorov model

被引:8
作者
Tomellini, M
Fanfoni, M
机构
[1] Univ Roma Tor Vergata, Dipartimento Sci & Tecnol Chim, I-00133 Rome, Italy
[2] Univ Roma Tor Vergata, Dipartimento Fis, I-00133 Rome, Italy
[3] Ist Nazl Fis Mat, I-00133 Rome, Italy
关键词
adatoms; computer simulations; growth; models of surface kinetics; nucleation;
D O I
10.1016/S0039-6028(99)00829-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
On the basis of the quasi-static approximation and for simultaneous nucleation the adatom lifetime, tau, during film growth at solid surfaces has been computed by Monte Carlo (MC) simulation. The quantity DN(0)tau, N-0, and D being respectively the cluster density and the adatom diffusion coefficient, is found to depend upon the portion of surface covered by clusters and, very weakly, on N-0. Moreover, a stochastic approach based on the Johnson-Mehl-Avrami-Kolmogorov (JMAK) theory has been developed to obtain the analytical expression of the MC curve. The collision factor of the mean island has been calculated and compared with those previously obtained from the uniform depletion approximation and the lattice approximation. (C) 1999 Elsevier Science B.V. All rights reserved.
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页码:L849 / L856
页数:8
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