Pulsed laser deposited Ta2O5 thin films as an electrochromic material

被引：16

作者：

Fu, ZW ^{[1
]}

Qin, QZ ^{[1
]}

机构：

[1] Fudan Univ, Laser Chem Inst, Shanghai 200433, Peoples R China

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 1999年 / 2卷 / 11期

关键词：

D O I：

10.1149/1.1390919

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Nanoscale Ta2O5 thin films were deposited on indium-tin oxide coated glass by 355 nm pulsed laser ablation of a metallic Ta target in O-3/O-2 ambient gases. The lithiation and electrochromic behavior of Ta2O5 film electrodes were investigated by cyclic voltammetry and in situ visible transmittance measurements for the first time. The results suggest that Ta2O5 films are an electrochromic material with a coloration efficiency of 10 cm(2)/C at 700 nm. (C) 1999 The Electrochemical Society. S1099-0062(99)06-018-6. All rights reserved.

引用

页码：600 / 601

页数：2

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