Preparation and structure of silicon doped tin oxide composites using an advanced ultrasonic spray method

被引：19

作者：

Huang, H

Kelder, EM

Chen, L

Schoonman, J

机构：

[1] Delft Univ Technol, Inorgan Chem Lab, Delft Interfac Res Ctr Renewable Energy, NL-2628 BL Delft, Netherlands

[2] Chinese Acad Sci, Inst Phys, Lab Solid State Ion, Beijing 100080, Peoples R China

来源：

SOLID STATE IONICS | 1999年 / 120卷 / 1-4期

关键词：

silicon doped; tin oxide; ultrasonic spray;

D O I：

10.1016/S0167-2738(98)00443-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ultra fine silicon-doped tin oxide composite powders have been synthesized using an advanced ultrasonic spray method. The SEM pictures revealed a particle size of about 100 nm. The structure and composition of the samples have been analyzed by XRD, FTIR, EDX and XPS. According to the XRD results, the as-prepared materials exhibit the rutile structure, with lattice parameters changing to some extent as the silicon dopant content increased. FTIR spectra showed SiO2 peaks and intensities increased in proportion to the nominal and EDX composition. XPS data were analyzed in detail and confirmed the Sn-O-Si bond exists in the composite. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：205 / 210

页数：6

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