Fabrication of flexible device based on PAN-PZT thin films by laser lift-off process

被引:33
作者
Do, Young Ho [1 ]
Kang, Min Gyu [1 ]
Kim, Jin Sang [1 ]
Kang, Chong Yun [1 ,2 ]
Yoon, Seok Jin [3 ]
机构
[1] Korea Inst Sci & Technol, Elect Mat Res Ctr, Seoul 136791, South Korea
[2] Korea Univ, IT NS, KU KIST Sch, Seoul 136701, South Korea
[3] Korea Inst Sci & Technol, Res Plannig & Coordinat Div, Seoul 136791, South Korea
基金
新加坡国家研究基金会;
关键词
Films process; Ferroelectric properties; PZT; Functional applications; Laser lift-off; TRANSPARENT; TRANSISTORS; SEMICONDUCTORS; ELECTRONICS; TFT;
D O I
10.1016/j.sna.2012.06.012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The ferroelectric properties of flexible devices based on 0.05Pb(Al0.5Nb0.5)O-3-0.95Pb(Zr0.52Ti0.48)O-3 + 0.7 wt.%Nb2O5 + 0.5 wt.%MnO2 (PAN-PZT) thin films, which were fabricated using a laser lift-off (LLO) process, were investigated. The flexible devices based on PAN-PZT thin films were coated with a sacrificial layer, which prevented or minimized damage during LLO process. The structural and electrical properties of the PAN-PZT thin films before and after LLO process demonstrated that the crystallographic and ferroelectric properties of the device were retained after LLO process. Flexible devices based on PAN-PZT thin films coated with a sacrificial layer may be fabricated using the LLO process for the production of flexible electronic devices. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:124 / 127
页数:4
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