Interaction of atomic hydrogen with potassium on MgO(100)

被引:11
作者
Huang, HH [1 ]
Jiang, X [1 ]
Zou, Z [1 ]
Xu, GQ [1 ]
机构
[1] NATL UNIV SINGAPORE,DEPT CHEM,SINGAPORE 119260,SINGAPORE
关键词
hydrogen; insulating surfaces; low index single crystal surfaces; magnesium oxide; metallic films; potassium; thermal desorption spectroscopy;
D O I
10.1016/S0039-6028(96)01407-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of potassium and its interaction with hydrogen atoms on MgO(100) have been studied by thermal desorption spectroscopy (TDS). The desorption energy of adsorbed K atoms was found to decrease from 82.3 to 78.5 kJ mol(-1) with increasing potassium coverage in the range of theta(k) less than or equal to 1 ML, which is attributed to the repulsive dipole interaction between adsorbed K atoms. At theta(k) < 1 ML, H-atoms are adsorbed and bound to the K adatoms on MgO(100), forming the H-K-O species. On multilayer K-covered surfaces, two hydrogen desorption peaks, alpha and alpha', were observed due to the thermal decomposition of two possible bulk hydrides formed beneath the surface. The beta peak in hydrogen desorption is probably related to the surface-adsorbed hydrogen species. In addition, hydrogen diffusion into the bulk during H-atom adsorption or thermal annealing has been observed. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:245 / 253
页数:9
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