Modeling and spectroscopic investigations on the evaporation of zirconia in a thermal rf plasma

被引:14
作者
Buchner, P [1 ]
Schubert, H [1 ]
Uhlenbusch, J [1 ]
Willée, K [1 ]
机构
[1] Univ Dusseldorf, Inst Laser & Plasmaphys, D-40225 Dusseldorf, Germany
关键词
thermal rf plasma; modeling; spectroscopy; plasma flash evaporation;
D O I
10.1023/A:1021816302453
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The evaporation process of zirconia powders injected in a thermal rf plasma is investigated. Both model calculations and optical emission spectroscopy are used to study the evaporation behavior. Gas temperatures and velocity distributions are determined numerically from conservation laws and Maxwell equations. The influence of plasma and particle parameters on the thermal history of entrained particles is discussed. Asymmetric Abel inversion is applied to detect asymmetric emission profiles in the plasma source. Spectroscopic measurements reveal that evaporated zirconium is concentrated near the axis of the plasma. Numerical calculations show that line-integrated emission profiles can be used to distinguish the cases of complete and incomplete evaporation. Axial emission profiles confirm that the evaporation zone is shifted upstream of the plasma when smaller precursor particles are used.
引用
收藏
页码:341 / 362
页数:22
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