What is laser conditioning? A review focused on dielectric multilayers

被引:41
作者
Bercegol, H [1 ]
机构
[1] CEA, CESTA, Dept Lasers Puissance, F-33114 Le Barp, France
来源
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998 | 1999年 / 3578卷
关键词
D O I
10.1117/12.344463
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser conditioning is a phenomenon which has been much explored during the last 15 years. Many optical components for high power lasers have shown enhancement of their laser-induced damage threshold after under-threshold pre-irradiation. The improvement brought by laser conditioning is thought to be necessary in the building of new NIF and LMJ lasers, especially for dielectric multilayers and KDP crystals. However, we lack of a complete physical explanation for the observations of conditioning. In particular, we don't know the effect of most physical parameters like pulselength, wavelength, repetition frequency of the laser shot. In this tentative review, we first gather results relevant to the general problem of laser conditioning, especially on dielectric multilayers irradiated with nanosecond pulselength. We find necessary to come back to the basic notion of damage and threshold. As a definition basis, we establish that laser conditioning is a damage (irreversible modification) with minor optical (functional) consequence and no continuing damaging with successive testing. This way of presenting the phenomenon contains a non-threshold description of optical damage. We finally explore some specific questions, that are technologically important for LMJ and NIF construction. Particularly, is laser conditioning necessary once we admit the occurrence of small damages, that is with a functional definition of damage threshold ?.
引用
收藏
页码:421 / 426
页数:6
相关论文
共 24 条
[1]  
ALLEN SD, 1982, APPL PHYS LETT, V41, P215
[2]  
BODEMANN A, 1996, SPIE P, V2714
[3]  
CHASE LL, 1992, SPIE P, V1624, P423
[4]   REACTIVE EVAPORATION OF LOW-DEFECT DENSITY HAFNIA [J].
CHOW, R ;
FALABELLA, S ;
LOOMIS, GE ;
RAINER, F ;
STOLZ, CJ ;
KOZLOWSKI, MR .
APPLIED OPTICS, 1993, 32 (28) :5567-5574
[5]   248 nm laser interaction studies on LaF3/MgF2 optical coatings by cross sectional transmission electron microscopy. [J].
Czigany, Z ;
Adamik, M ;
Kaiser, N .
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1996, 1997, 2966 :187-193
[6]   Nano absorbing centers: A key point in laser damage of thin films. [J].
Dijon, J ;
Poiroux, T ;
Desrumaux, C .
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1996, 1997, 2966 :315-325
[7]  
EVA E, 1996, APP OPT
[8]   TEMPORARY LASER DAMAGE THRESHOLD ENHANCEMENT BY LASER CONDITIONING OF ANTIREFLECTION-COATED GLASS [J].
FRINK, ME ;
ARENBERG, JW ;
MORDAUNT, DW ;
SEITEL, SC ;
BABB, MT ;
TEPPO, EA .
APPLIED PHYSICS LETTERS, 1987, 51 (06) :415-417
[9]  
KAISER N, 1994, SPIE, V2428, P400
[10]  
KARDACH JA, 1988, NIST SPEC PUBL, V752, P488