Application of Bessel beams for microfabrication of dielectrics by femtosecond laser

被引：84

作者：

Marcinkevicius, A

Juodkazis, S

Matsuo, S

Mizeikis, V

Misawa, H

机构：

[1] Univ Tokushima, Lab Photon Nanomat, Tokushima 7708506, Japan

[2] Univ Tokushima, Dept Ecosyst Engn, Tokushima 7708506, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2001年 / 40卷 / 11A期

关键词：

laser materials processing; laser-induced breakdown; ultrafast phenomena; Bessel beam; vitreous silica;

D O I：

10.1143/JJAP.40.L1197

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 10(2)-10(3) in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.

引用

收藏

页码：L1197 / L1199

页数：3

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