Inherent superhydrophobicity of Sn/SnOx films prepared by surface self-passivation of electrodeposited porous dendritic Sn

被引：23

作者：

Cao, Ling ^{[1
]}

Liu, Jun ^{[1
]}

Xu, Shili ^{[1
]}

Xia, Yue ^{[1
]}

Huang, Wei ^{[1
]}

Li, Zelin ^{[1
]}

机构：

[1] Hunan Normal Univ, Key Lab Chem Biol & Tradit Chinese Med Res, Minist Educ China, Changsha 410081, Hunan, Peoples R China

来源：

MATERIALS RESEARCH BULLETIN | 2013年 / 48卷 / 11期

基金：

中国国家自然科学基金;

关键词：

Metals; Oxides; Thin films; Microstructure; Surface properties; OXIDE THIN-FILMS; ELECTROCHEMICAL DEPOSITION; CLEANING SURFACES; WETTABILITY; FABRICATION; TEMPLATE; GROWTH; NANOSTRUCTURES; CONVERSION; SUBSTRATE;

D O I：

10.1016/j.materresbull.2013.08.044

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Superhydrophobic Sn/SnOx (x = 1 and 2) films were facilely fabricated by surface self-passivation of three-dimensional (3D) hierarchical porous dendritic Sn while exposed to the air. The porous dendritic Sn was obtained rapidly by electrodeposition accompanying release of hydrogen bubbles. Influence of electrodeposition parameters on the surface morphology and wettabillity has been investigated in detail, including deposition potentials, deposition times and electrolyte concentrations. The maximum contact angle reached to 165 degrees on the porous dendritic Sn/SnOx film electrodeposited in a solution of 60 mM SnCl2 and 1.5 M H2SO4 under -1.7 V for 20 s. Both the hierarchical micro-nanostructures and the spontaneously formed ultrathin surface passivation layer of Sn oxides endow the prepared Sn/SnOx surface with excellent inherent superhydrophobicity without further surface modification. (C) 2013 Elsevier Ltd. All rights reserved.

引用

页码：4804 / 4810

页数：7

共 57 条

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