Control of polystyrene-block-poly(methyl methacrylate) directed self-assembly by laser-induced millisecond thermal annealing

被引:8
作者
Jacobs, Alan G. [1 ]
Jung, Byungki [1 ]
Jiang, Jing [1 ]
Ober, Christopher K. [1 ]
Thompson, Michael O. [1 ]
机构
[1] Cornell Univ, Mat Sci & Engn, Ithaca, NY 14853 USA
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2015年 / 14卷 / 03期
基金
美国国家科学基金会;
关键词
directed self-assembly; chemoepitaxy; laser spike annealing; PS-b-PMMA; defectivity; order-disorder transition; BLOCK-COPOLYMER FILMS; MICROPHASE SEPARATION; DIBLOCK COPOLYMER; POLYSTYRENE;
D O I
10.1117/1.JMM.14.3.031205
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Directed self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) during laser thermal annealing at peak temperatures of 300 degrees C-800 degrees C for dwells of 1-10 ms has been explored. The enhanced mobility of polymer chains at these temperatures improves registration compared with conventional thermal anneals. PS-b-PMMA films (forming 15-nm line/space standing lamellae) were cast on chemically patterned substrates with a copolymer neutral layer and annealed by laser and hot plate. Annealing by hot plate or multiple laser scans resulted in well-aligned features over micron length scales. By laser annealing multiple times, defectivity was reduced by similar to 60%. However, laser annealing for only 10 ms before performing a hot plate anneal reduced defectivity by >80%. We believe that this reduction arises from improved interfacial alignment of the film to the template during laser annealing near the order-disorder transition. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
引用
收藏
页数:7
相关论文
共 33 条
[1]   Phase Behavior of Polystyrene-b-poly(methyl methacrylate) Diblock Copolymer [J].
Ahn, Hyungju ;
Ryu, Du Yeol ;
Kim, Youngmin ;
Kwon, Kyung Wook ;
Lee, Jumi ;
Cho, Junhan .
MACROMOLECULES, 2009, 42 (20) :7897-7902
[2]   Block Copolymer Lithography [J].
Bates, Christopher M. ;
Maher, Michael J. ;
Janes, Dustin W. ;
Ellison, Christopher J. ;
Willson, C. Grant .
MACROMOLECULES, 2014, 47 (01) :2-12
[3]   FLUCTUATION EFFECTS IN A SYMMETRIC DIBLOCK COPOLYMER NEAR THE ORDER-DISORDER TRANSITION [J].
BATES, FS ;
ROSEDALE, JH ;
FREDRICKSON, GH .
JOURNAL OF CHEMICAL PHYSICS, 1990, 92 (10) :6255-6270
[4]   Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer [J].
Bosworth, Joan K. ;
Black, Charles T. ;
Obert, Christopher K. .
ACS NANO, 2009, 3 (07) :1761-1766
[5]   INTERACTION ENERGIES FOR BLENDS OF POLY(METHYL METHACRYLATE), POLYSTYRENE, AND POLY(ALPHA-METHYLSTYRENE) BY THE CRITICAL MOLECULAR-WEIGHT METHOD [J].
CALLAGHAN, TA ;
PAUL, DR .
MACROMOLECULES, 1993, 26 (10) :2439-2450
[6]   Templated self-assembly of block copolymers: Top-down helps bottom-up [J].
Cheng, Joy Y. ;
Ross, Caroline A. ;
Smith, Henry I. ;
Thomas, Edwin L. .
ADVANCED MATERIALS, 2006, 18 (19) :2505-2521
[7]   Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment [J].
Delgadillo, Paulina A. Rincon ;
Gronheid, Roel ;
Thode, Christopher J. ;
Wu, Hengpeng ;
Cao, Yi ;
Neisser, Mark ;
Somervell, Mark ;
Nafus, Kathleen ;
Nealey, Paul F. .
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (03)
[8]   Rapid thermal processing of self-assembling block copolymer thin films [J].
Ferrarese Lupi, F. ;
Giammaria, T. J. ;
Ceresoli, M. ;
Seguini, G. ;
Sparnacci, K. ;
Antonioli, D. ;
Gianotti, V. ;
Laus, M. ;
Perego, M. .
NANOTECHNOLOGY, 2013, 24 (31)
[9]   FLUCTUATION EFFECTS IN THE THEORY OF MICROPHASE SEPARATION IN BLOCK COPOLYMERS [J].
FREDRICKSON, GH ;
HELFAND, E .
JOURNAL OF CHEMICAL PHYSICS, 1987, 87 (01) :697-705
[10]   Solvothermal Annealing of Block Copolymer Thin Films [J].
Gotrik, Kevin W. ;
Ross, C. A. .
NANO LETTERS, 2013, 13 (11) :5117-5122