Nanoscale EELS analysis of oxides: composition mapping, valence determination and beam damage

被引:23
作者
Bentley, J. [1 ]
Gilliss, S. R. [2 ]
Carter, C. B. [2 ]
Al-Sharab, J. F. [3 ]
Cosandey, F. [3 ]
Anderson, I. M. [1 ]
Kotula, P. J. [4 ]
机构
[1] Oak Ridge Natl Lab, Met & Ceram Div, POB 2008, Oak Ridge, TN 37831 USA
[2] Univ Minnesota, Dept Chem Engn & Mat Sci, Minneapolis, MN 55455 USA
[3] Rutgers State Univ, Ceram & Mat Engn, Piscataway, NJ 08904 USA
[4] Sandia Natl Labs, Mat Characterizat Dept, Albuquerque, NM 87185 USA
来源
EMAG-NANO 2005: IMAGING, ANALYSIS AND FABRICATION ON THE NANOSCALE | 2006年 / 26卷
基金
美国国家科学基金会;
关键词
D O I
10.1088/1742-6596/26/1/016
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Beam damage to ceria abrasive particles during EELS measurements with -1 nm probes of similar to 1 nA was negligible for typical analysis times (1-5 s). Ce3+ and tri-valent impurities reduce near-surface regions. Ce valence was measured from Ce M-5/M-4 white line ratios. By defocusing a 1 nA probe to similar to 5 nm, beam damage to nanoscale MgAl2O4 spinel was sufficiently slowed to allow spectrum imaging measurements of composition variations. Recording spectrum lines in TEM mode can be attractive when dose-rate rather than dose is the limiting factor in beam damage. Multivariate statistical analysis of data from a CoO-Co3O4 interface has revealed an additional interface-related component.
引用
收藏
页码:69 / +
页数:2
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