Influence of growth mode on the structural, optical, and electrical properties of In-doped ZnO nanorods

被引:30
作者
Jung, M. N. [1 ]
Koo, J. E. [1 ]
Oh, S. J. [1 ]
Lee, B. W. [2 ]
Lee, W. J. [3 ]
Ha, S. H. [4 ]
Cho, Y. R. [4 ]
Chang, J. H. [1 ]
机构
[1] Korea Maritime Univ, Major Nanosemicond, Pusan 606791, South Korea
[2] Korea Maritime Univ, Dept Mat Engn, Pusan 606791, South Korea
[3] Dong Eui Univ, Elect Ceram Ctr, Pusan 614714, South Korea
[4] Pusan Natl Univ, Div Mat Sci & Engn, Pusan 609735, South Korea
关键词
carrier density; electron field emission; Hall effect; II-VI semiconductors; indium; nanostructured materials; photoluminescence; semiconductor growth; solid solubility; wide band gap semiconductors; X-ray diffraction; zinc compounds; DEPOSITION; MECHANISM;
D O I
10.1063/1.3064919
中图分类号
O59 [应用物理学];
学科分类号
摘要
The growth mechanism of In-doped ZnO (ZnO:In) nanorods grown on AuGe/Si(111) substrates has been investigated. Unlike to general vapor-liquid-solid mechanism, the adatom kinetics on the surface determines the length-diameter relationship [L(D)], initial nuclei size (D(*)), and spatial distribution of impurity atoms. The incorporated In-concentration was estimated to be within solid solubility limit of ZnO in terms of x-ray diffraction analysis, but the evolution of photoluminescence peak position and intensity revealed an evidence of extrinsic carrier increment. Hall-effect measurement was used to evaluate the carrier concentration of ZnO:In nanorods.
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页数:3
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