Nano-lithography with atoms

被引：27

作者：

Bell, AS ^{[1
]}

Brezger, B ^{[1
]}

Drodofsky, U ^{[1
]}

Nowak, S ^{[1
]}

Pfau, T ^{[1
]}

Stuhler, J ^{[1
]}

Schulze, T ^{[1
]}

Mlynek, J ^{[1
]}

机构：

[1] Univ Konstanz, Fak Phys, D-78457 Constance, Germany

来源：

SURFACE SCIENCE | 1999年 / 433卷

关键词：

alkali metals; atomic force microscopy; chromium; growth; noble gases;

D O I：

10.1016/S0039-6028(99)00083-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from various groups ale discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given. (C) 1999 Elsevier Science B.V. All rights reserved.

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收藏

页码：40 / 47

页数：8

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