We have prepared solution-processed oxide semiconductor thin-film transistors using ZnO nanoparticles with various particle shapes. Uniform, dense, thin films were produced by spin-coating ZnO nanoparticle dispersions containing either nanorods or nanospheres. The influence of annealing atmosphere on both nanoparticle-based TIT devices was investigated. XPS analysis revealed that the ZnO particles of the nanorod and nanosphere dispersions have distinct stoichiometries (i.e., molar ratios of Zn:O). The starting particles in turn predetermine the carrier concentration within the annealed ZnO films, which in turn determines whether the device is a semiconductor or metallic conductor, depending upon the annealing atmosphere. Grain structures of the channel layer also play an important role in determining the device performance of the nanoparticle derived ZnO TFTs. (C) 2008 Elsevier Ltd. All rights reserved.
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Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Cao, HT
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Pei, ZL
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Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Pei, ZL
;
Gong, J
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Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Gong, J
;
Sun, C
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Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Sun, C
;
Huang, RF
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Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Huang, RF
;
Wen, LS
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Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
机构:
Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Cao, HT
;
Pei, ZL
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Pei, ZL
;
Gong, J
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h-index: 0
机构:
Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Gong, J
;
Sun, C
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h-index: 0
机构:
Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Sun, C
;
Huang, RF
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h-index: 0
机构:
Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
Huang, RF
;
Wen, LS
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R ChinaChinese Acad Sci, Inst Met Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China