Photofabrication of the third dimension of NiTi shape memory alloy microactuators

This paper describes experimental results of using various microlithography techniques to fabricate a range of microactuator devices from NiTi shape memory alloys. The range of products includes: planar double-beams from rolled foils etched from both sides tapered double-beams planar double beams from sputter-deposited films etched from one side a tubular test piece. Such photofabrication is not easily achieved and problems discussed in this paper include: achieving acceptable edge profiles of the materials while maintaining high etch factors tapering foil microactuators by means of chemical micro milling coating NiTi tubes with electrophoretic photoresist imaging a curved surface with a small radius of curvature control of etching parameters for a constant rate of etch the influence of NiTi oxide coatings on etching and technical comparisons with other potential manufacturing processes.