Self-controlled growth of silica thin films for nanopatterning

被引：25

作者：

Cho, G

Jang, J

Jung, S

Moon, IS

Lee, JS

Cho, YS

Fung, BM

Yuan, WL

O'Rear, EA

机构：

[1] Sunchon Natl Univ, Dept Chem Engn, Chungnam 540742, South Korea

[2] Sunchon Natl Univ, Nanotechnol Ctr, Chungnam 540742, South Korea

[3] K JIST, Dept Mat Sci & Engn, Kwangju 506712, South Korea

[4] Univ Oklahoma, Dept Chem & Biochem, Norman, OK 73019 USA

[5] Univ Oklahoma, Dept Chem Engn & Mat Sci, Norman, OK 73019 USA

来源：

LANGMUIR | 2002年 / 18卷 / 09期

关键词：

D O I：

10.1021/la015688n

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report a new method to control both the nucleation and growth of SiO2 to form nanopatterns width in an oil phase, using poly(styrene-b-4-vinylpyridine) (PS-b-4PV) as a template. The resulting SiO2 can be selectively grown on protonated 4VP blocks up to a height of 8 nm by 60 nm.

引用

页码：3430 / 3433

页数：4

共 31 条

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2-S

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