Theoretical study of the Cl-passivated Si(111) surface

被引:11
作者
Ricca, A [1 ]
Musgrave, CB
机构
[1] NASA, Ames Res Ctr, Thermosci Inst, Moffett Field, CA 94035 USA
[2] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
[3] Stanford Univ, Dept Mat Sci, Stanford, CA 94305 USA
关键词
abstraction reactions; binding energy; clusters; density functional theory; gas-surface interactions; infrared spectra;
D O I
10.1016/S0039-6028(99)00407-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The Cl-passivated Si(111) surface is studied using density functional theory, in conjunction with the B3LYP functional and the cluster model. We compute the Si-Cl frequency and the Si-Cl bond energy for R3SiCl, and the abstraction barrier for the reaction R3SiCl + H --> R3Si + HCl using the B3LYP approach. We calibrate the B3LYP bond energy and the abstraction barriers using the values obtained using the G2MP2, G2 and CCSD(T) approaches. Our computed B3LYP Si-Cl frequency of 555 cm(-1) is in good agreement with the experimental value of 588 cm(-1). The shift in the Si-Cl frequency as surface chlorine is added to the cluster agrees with experimental observations. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:116 / 125
页数:10
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