Surface quality of x-ray mirrors evaluated at the Advanced Photon Source

被引:3
作者
Assoufid, L [1 ]
Khounsary, A [1 ]
Qian, J [1 ]
Macrander, A [1 ]
Mills, D [1 ]
机构
[1] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA
来源
X-RAY MIRRORS, CRYSTALS AND MULTILAYERS | 2001年 / 4501卷
关键词
x-ray mirrors; surface figure; surface slope error; roughness; slope error; metrology; synchrotron radiation;
D O I
10.1117/12.448498
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
X-ray mirrors are polished and often coated optical substrates used on many synchrotron x-ray beamlines to reflect, focus, steer, or filter x-ray beams. Because their performance depends strongly on their surface quality, they are usually evaluated after delivery, independently (from the vendor), for compliance before acceptance by the buyer. This paper summarizes results of surface roughness and slope error measurements of mirrors delivered to the Advanced Photon Source (APS) and evaluated in the metrology laboratory during the period 1996 - 2001, using non-contact surface profilometry. For all the mirrors evaluated, the measured root-mean square (rms) slope error values range from 0.5 to 4.7 murad rms, and the surface rms values range from 0.9 to 4.3 A rms. Most of the measured mirrors have met the user specifications.
引用
收藏
页码:54 / 62
页数:9
相关论文
共 10 条
[1]  
ASSOUFID L, 1998, SPIE, V3447, P106
[2]  
BECKER K, 1987, SPIE, V802, P209
[3]   DIRECT COMPARISON OF MECHANICAL AND OPTICAL MEASUREMENTS OF THE FINISH OF PRECISION MACHINED OPTICAL-SURFACES [J].
CHURCH, EL ;
VORBURGER, TV ;
WYANT, JC .
OPTICAL ENGINEERING, 1985, 24 (03) :388-395
[4]  
Creath K., 1988, Progress in optics. Vol.XXVI, P349, DOI 10.1016/S0079-6638(08)70178-1
[5]   Elliptical x-ray microprobe mirrors by differential deposition [J].
Ice, GE ;
Chung, JS ;
Tischler, JZ ;
Lunt, A ;
Assoufid, L .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (07) :2635-2639
[6]  
SRAJER G, 1998, VERTICALLY FOCUSING
[7]  
TAKACS P, 1989, Patent No. 4884697
[8]   Improvements in the accuracy and the repeatability of long trace profiler measurements [J].
Takacs, PZ ;
Church, EL ;
Bresloff, CJ ;
Assoufid, L .
APPLIED OPTICS, 1999, 38 (25) :5468-5479
[9]  
VENKATARAMAN C, 2001, MEASUREMENT VERTICAL
[10]  
WYANT JC, 38 M ASLE