Recognition-directed orthogonal self-assembly of polymers and nanoparticles on patterned surfaces

被引：89

作者：

Xu, H ^{[1
]}

Hong, R ^{[1
]}

Lu, TX ^{[1
]}

Uzun, O ^{[1
]}

Rotello, VM ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Chem, Amherst, MA 01003 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2006年 / 128卷 / 10期

关键词：

D O I：

10.1021/ja058686o

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We demonstrate the patterning of silica substrates with thymine (Thy-PS) and positively charged N-methylpyridinium (PVMP) polymers using photolithography and the subsequent orthogonal modification of these surfaces using diaminopyridine-functionalized polystyrene (DAP-PS) and carboxylate-derivatized CdSe/ZnS core-shell nanoparticles (COO-NP) through diamidopyridine-thymine three-point hydrogen bonding and pyridinium-carboxylate electrostatic interactions, respectively. This two-component orthogonal surface modification was accomplished in a self-sorting, single-step fashion, providing a versatile tool for the rapid and efficient creation of complex materials. Copyright © 2006 American Chemical Society.

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收藏

页码：3162 / 3163

页数：2

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