Growth, structure and epitaxy of ultrathin NiO films on Ag(001)

被引：29

作者：

Luches, P

Altieri, S

Giovanardi, C

Moia, TS

Valeri, S

Bruno, F

Floreano, L

Morgante, A

Santaniello, A

Verdini, A

Gotter, R

Hibma, T

机构：

[1] INFM, I-41100 Modena, Italy

[2] Univ Modena, Dipartimento Fis, I-41100 Modena, Italy

[3] INFM, Lab TASC, I-34012 Trieste, Italy

[4] Univ Trieste, Dipartimento Fis, Trieste, Italy

[5] Sincrotrone Trieste, I-34012 Trieste, Italy

[6] Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

来源：

THIN SOLID FILMS | 2001年 / 400卷 / 1-2期

关键词：

nickel oxide; silver; epitaxy; photoelectron diffraction; specular X-ray reflectivity;

D O I：

10.1016/S0040-6090(01)01496-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

NiO ultrathin films have been grown on Ag(001) by Ni deposition in an O-2 atmosphere. The thickness range 5-50 NIL has been investigated. X-ray photoelectron spectroscopy has been used to study the stoichiometric composition and chemical purity of the oxide films. We found completely oxidized stoichiometric NiO films. Their contamination has been found to be limited to the topmost layers. Photoelectron diffraction has given information concerning the local crystal structure of the films. The film atomic geometry has been found to be the same independent of thickness in the 0-50 ML range. The films have the expected (001) rock-salt structure with the same in plane orientation as the Ag(001) substrate. Specular X-ray reflectivity has allowed a very accurate thickness evaluation and has given information on the width of the density gradients at the film-substrate and vacuum-film interfaces, found to be of the order of a few atomic layers. (C) 2001 Elsevier Science B.V All rights reserved.

引用

页码：139 / 143

页数：5

共 14 条

[1] Reduction of Coulomb and charge-transfer energies in oxide films on metals [J].