Photocatalytic activity of TiO2 thin films doped with nitrogen using a cathodic magnetron plasma treatment

被引：35

作者：

Yamada, Kenji ^{[1
]}

Yamane, Hirokazu ^{[1
]}

Matsushima, Shigenori ^{[1
]}

Nakamura, Hiroyuki ^{[1
]}

Sonoda, Tatsuhiko ^{[1
]}

Miura, Satoshi ^{[1
]}

Kumada, Kiyoshi ^{[1
]}

机构：

[1] Kitakyushu Natl Coll Technol, Dept Mat Sci & Chem Engn, Kokuraminami Ku, Kitakyushu, Fukuoka 8020985, Japan

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 21期

关键词：

titanium dioxide; plasma; doping; band gap; photocatalysis; visible light activity;

D O I：

10.1016/j.tsf.2008.05.048

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiO2 films are treated using a magnetron nitrogen-plasma apparatus that can generate high density plasma to realize nitrogen-doping. The films are treated for 5 min with nitrogen plasma at a discharge power from 30 to 100 W by a radio frequency generator operating at 13.56 MHz. The plasma treated films show visible light absorption in the range of around 400-500 nm. light absorption above approximately 500 nm is also observed in the film plasma treated at a high discharge power. It is confirmed from N-1s and Ti-2p X-ray photoelectron spectra of the films that Ti-N bonds and oxygen vacancies are formed. Visible light activity of photocatalysis in the film increases with increasing discharge power and then decreases. Such an increase and decrease in the visible light activity are due to the formation of Ti-N bonds and oxygen vacancies, respectively. The visible light activity is improved with the optimum plasma treatment. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：7560 / 7564

页数：5

共 16 条

[1] Visible-light photocatalysis in nitrogen-doped titanium oxides [J].