Photoreactive coating for high-contrast spatial patterning of microfluidic device wettability

被引：110

作者：

Abate, Adam R. ^{[1
]}

Krummel, Amber T. ^{[1
]}

Lee, Daeyeon ^{[1
]}

Marquez, Manuel ^{[2
,3
,4
]}

Holtze, Christian ^{[5
]}

Weitz, David A. ^{[1
]}

机构：

[1] Harvard Univ, Dept Phys, Sch Engn & Appl Sci, Cambridge, MA 02138 USA

[2] NIST, Ctr Theoret & Computat Nanosci, Gaithersburg, MD 20899 USA

[3] Los Alamos Natl Lab, Ctr Integrated Nanotechnol, Los Alamos, NM 87545 USA

[4] Arizona State Univ, Harrington Dept Bioengn, Los Alamos, NM 87545 USA

[5] BASF AG, D-6700 Ludwigshafen, Germany

来源：

LAB ON A CHIP | 2008年 / 8卷 / 12期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1039/b813405g

中图分类号：

Q5 [生物化学];

学科分类号：

071010 ; 081704 ;

摘要：

For many applications in microfluidics, the wettability of the devices must be spatially controlled. We introduce a photoreactive sol-gel coating that enables high-contrast spatial patterning of microfluidic device wettability.

引用

页码：2157 / 2160

页数：4

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