Improvement of soft magnetism of Fe90Co10 sputtered films by addition of N and Ta

被引:7
作者
Nakagawa, S
Tanaka, S
Suemitsu, K
Naoe, M
机构
[1] Deptartment of Physical Electronics, Tokyo Institute of Technology, Meguro
关键词
D O I
10.1063/1.361539
中图分类号
O59 [应用物理学];
学科分类号
摘要
The addition of Ta and N into sputtered Fe90Co10 alloy films was performed to attain soft magnetism with large saturation magnetization 4 pi M(s) of about 21 kG. The deposition of Fe-Co and Fe-Co-Ta films at N-2 partial pressure P-N2 below 0.1 m Torr was so effective as to cause fine granulation in the film. Fe84.6Co8.4Ta7:N films deposited at P-N2 of about 0.2 mTorr and postannealed at 150 degrees C revealed 4 pi M(s) and relative permeability mu(r) of about 16 kG and 1500, respectively. (C) 1996 American Institute of Physics.
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收藏
页码:5156 / 5158
页数:3
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