Preferential vaporization and plasma shielding during nano-second laser ablation

被引:75
作者
Mao, XL
Chan, WT
Caetano, M
Shannon, MA
Russo, RE
机构
[1] LAWRENCE BERKELEY LAB,BERKELEY,CA 94720
[2] UNIV HONG KONG,DEPT CHEM,HONG KONG,HONG KONG
[3] CENT UNIV VENEZUELA,ESCUELA QUIM,CARACAS 1020A,VENEZUELA
[4] UNIV ILLINOIS,DEPT MECH ENGN,URBANA,IL 61801
关键词
D O I
10.1016/0169-4332(95)00420-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Preferential removal of components from mixed material targets and plasma shielding are studied by using inductively coupled plasma-atomic emission spectrometry (LCP-AES) during UV nano-second laser ablation. The ICP emission intensity for Cu and Zn during ablation of brass samples varies versus laser power density. A model using thermal evaporation and inverse Bremsstrahlung processes is presented. The model shows that plasma shielding occurs at approximately 0.3 GW/cm(2), in agreement with experimental data for change in the mass ablation rate. The good agreement of model and experimental data suggest that thermal effects are important during nano-second laser ablation for power density less than 0.3 GW/cm(2).
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页码:126 / 130
页数:5
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