Principal component analysis of plasma harmonics in end-point detection of photoresist stripping

被引：13

作者：

Koh, ATC ^{[1
]}

Thornhill, NF ^{[1
]}

Law, VJ ^{[1
]}

机构：

[1] Univ London Univ Coll, Dept Elect & Elect Engn, London WC1E 7JE, England

来源：

ELECTRONICS LETTERS | 1999年 / 35卷 / 16期

关键词：

D O I：

10.1049/el:19990930

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A principal component analysis (PCA) of plasma-generated harmonics monitored using a non-invasive ex-situ probe is reported. PCA trends due to gas pressure and RF power were demonstrated. Changes in harmonic levels during photoresist stripping have also been detected and were analysed with PCA to provide process end-point detection.

引用

页码：1383 / 1385

页数：3

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