Experimental results and modeling of noise coupling in a lightly doped substrate

被引:18
作者
Blalack, T
Lau, J
Clement, FJR
Wooley, BA
机构
来源
IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996 | 1996年
关键词
D O I
10.1109/IEDM.1996.554060
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
While an in-depth experimental study of substrate noise coupling in an epi process has been reported [1], most research into substrate coupling in lightly doped bulk wafers has been limited to simulations without experimental confirmation. This work presents experimental noise coupling data for a lightly doped substrate, along with corresponding simulation results obtained using a compact model of the substrate. The results of this work provide a general understanding of noise coupling in lightly doped substrates and emphasize the layout dependence of such noise. Without an efficient simulation capability utilizing a compact model of the substrate, it is extremely difficult to predict how noise will couple to a circuit node.
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页码:623 / 626
页数:4
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