Chromium carbide thin films synthesized by pulsed Nd:YAG laser deposition

被引：23

作者：

Suda, Y ^{[1
]}

Kawasaki, H ^{[1
]}

Terajima, R ^{[1
]}

Emura, M ^{[1
]}

机构：

[1] Sasebo Natl Coll Technol, Dept Elect Engn, Nagasaki 8571193, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 6A期

关键词：

chromium carbide; pulsed laser deposition; substrate temperature;

D O I：

10.1143/JJAP.38.3619

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Chromium carbide thin films are synthesized on Si(100) substrates by a pulsed Nd:YAG laser deposition method at different substrate temperatures. Glancing-angle X-ray diffraction shows that a crystalline chromium carbide film can be prepared at the substrate temperature of 700 degrees C. Grain size of the films, examined with a field-emission secondary electron microscope, increases with increasing substrate temperature.

引用

页码：3619 / 3621

页数：3

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