Deposition and properties of plasma polymer films made from thiophenes

被引：23

作者：

Kiesow, A

Heilmann, A ^{[1
]}

机构：

[1] Tech Univ Chemnitz, Inst Phys, D-09107 Chemnitz, Germany

[2] Fraunhofer Inst Mech Mat, D-06120 Halle, Germany

来源：

THIN SOLID FILMS | 1999年 / 343卷

关键词：

plasma polymerization; optical emission spectroscopy; thiophenes; d.c; conductivity;

D O I：

10.1016/S0040-6090(98)01598-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin plasma polymer films were deposited by plasma polymerisation of thiophene (C4H4S) and iodothiophene (C4H3SI) Optical emission spectroscopy (OES) was applied during film deposition to characterise the plasma at various energy input levels and various monomer' partial pressures. The electrical direct current conductivity for films deposited at various preparation conditions were calculated based on current voltage relationships which were observed. The maximum conductivity of an undoped thiophene film was sigma approximate to 1.3 x 10(-6) Omega(-1) cm(-1) (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：338 / 341

页数：4

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