Photooxidation of poly(para-xylylene)

被引:31
作者
Bera, M
Rivaton, A [1 ]
Gandon, C
Gardette, JL
机构
[1] Univ Blaise Pascal, UMR CNRS 6505, Photochim Mol & Macromol Lab, F-63177 Clermont Ferrand, France
[2] St Gobain Res, Aubervilliers, France
关键词
poly(para-xylylene); parylene; photooxidation;
D O I
10.1016/S0014-3057(99)00258-X
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The photochemical behaviour of poly(para-xylylene) (PPX or parylene N) under polychromatic irradiation has been investigated by FTIR, UV-Visible and emission analysis. The various photoproducts formed have been identified by chemical titration, derivatisation reactions, physical treatments associated with the analysis by mass spectrometry of the gas phase and HPLC analysis of the low molecular weight fragments after methanolic extraction. The experimental results indicate that direct excitation of PPX units can occur at lambda > 300 nm. In the presence of oxygen, radicalar species formed in direct photolysis are able to induce the oxidation of the methylene groups of PPX through hydrogen abstraction. The photo-unstable secondary hydroperoxides that are then formed lead subsequently to the formation of various oxidised species that have been identified. In parallel, the detection of aliphatic carboxylic acids indicates the oxidation and the cleavage of the aromatic rings. As a consequence of the chain scissions provoked by oxidation of the methylene groups located on both sides of the aromatic rings, the photoproducts are predominantly low molecular weight oxidation species. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1753 / 1764
页数:12
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