Effects of organic additives on electroplated soft magnetic CoFeCr films

被引：27

作者：

Lallemand, F

Comte, D

Ricq, L

Renaux, P

Pagetti, J

Dieppedale, C

Gaud, P

机构：

[1] Univ ST Franche Comt, Lab Chim Mat & Interfaces, UFR ST, Traitements Surface & Syst Electrochim, F-25000 Besancon, France

[2] CEA, LETI, Alditech, F-38054 Grenoble 9, France

[3] CEA Grenoble, LETI, STMS, Dept Silicate Technol, F-38054 Grenoble 9, France

来源：

APPLIED SURFACE SCIENCE | 2004年 / 225卷 / 1-4期

关键词：

organic additives; anti-corrosion properties; electrodeposition; CoFeCr films; magnetic properties;

D O I：

10.1016/j.apsusc.2003.09.033

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Soft magnetic CoFeCr films produced with high saturation magnetic flux density, B-s = 1.7 T, low coercivity, H-c = 0.6 Oe, and high film resistivity, p = 40 M cm, are potentially useful in high density magnetic recording head. The electrodeposition of CoFeCr ternary alloy is investigated in the presence of two sulfur containing organic additives, saccharin (SAC) and o-toluene sulfonamide (oTOL). The results demonstrated that the CoFeCr films produced with SAC or oTOL have the same structural and magnetic properties. However, a corrosion behavior study shows that the CoFeCr deposits prepared with oTOL are very attractive for their stability in corrosive conditions. This additive (oTOL) can be considered as a good candidate for electroplated soft magnetic CoFeCr films. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：59 / 71

页数：13

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