A negative-working alkaline developable photoresist based on calix[4]resorcinarene, a cross-linker, and a photoacid generator

被引：54

作者：

Nakayama, T ^{[1
]}

Haga, K ^{[1
]}

Haba, O ^{[1
]}

Ueda, M ^{[1
]}

机构：

[1] YAMAGATA UNIV, GRAD SCH ENGN, DEPT HUMAN SENSING & FUNCT SENSOR ENGN, YONEZAWA, YAMAGATA 992, JAPAN

来源：

CHEMISTRY LETTERS | 1997年 / 03期

关键词：

D O I：

10.1246/cl.1997.265

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A negative working photoresist based on calix[4]resorcinarene, 4,4'-methylenebis[2,6-bis(hydroxymethyl) (MBHP) as a cross-linker, and a photoacid generator, diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS), has been developed. A clear negative pattern was obtained when it was exposed to 365 nm UV light and postbaked at 130 degrees C, followed by developing with a 0.5% aqueous tetramethylammonium hydroxide solution at room temperature.

引用

页码：265 / 266

页数：2

共 8 条

[1]

ALLEN RD, 1995, P SOC PHOTO-OPT INS, V2438, P250, DOI 10.1117/12.210346

[2]

FUJITA J, 1995, APPL PHYS LETT, V68, P250

[3]

FUJITA J, 1995, APPL PHYS LETT, V68, P2438

[4]

GUTSCHE CD, 1995, ALDRICHIM ACTA, V28, P3