Critical radius for interface separation of a compressively stressed film from a rough surface

被引:67
作者
Clarke, DR [1 ]
Pompe, W
机构
[1] Univ Calif Santa Barbara, Dept Mat, Coll Engn, Santa Barbara, CA 93106 USA
[2] Tech Univ Dresden, D-8027 Dresden, Germany
关键词
D O I
10.1016/S1359-6454(99)00078-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surfaces are often roughened so that coatings under residual compression will remain intact and adherent. By representing surface roughness as a sinusoidal surface and comparing the elastic strain and surface energies of a compressively stressed film, it is shown that there exists a critical radius of curvature below which interface separation is energetically favored. As with many other residual stress problems in thin films, separation depends on a dimensionless group, in this case ((RET)-E-2/h(3)sigma(b)(2)) where R is the local radius of curvature, Gamma the fracture resistance of the interface and E, h and sigma(b) are the film modulus, film thickness and residual stress, respectively. (C) 1999 Acta Metallurgica Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1749 / 1756
页数:8
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